ISO 25498:2018 マイクロビーム分析—分析電子顕微鏡法—透過型電子顕微鏡を使用した選択領域電子回折分析 | ページ 6

3.1

Miller index

notation system for crystallographic planes and directions in crystals, in which a set of lattice planes or directions is described by three axes coordinate

3.2

Miller-Bravais index

notation system for crystallographic planes and directions in hexagonal crystals, in which a set of lattice planes or directions is described by four axes coordinate

3.3

(h k l)

Miller indices (3.1) of a specific set of crystallographic planes

3.4

{hkl}

Miller indices (3.1) which denote a family of crystallographic planes

3.5

[uvw]

Miller indices (3.1) of a specific crystallographic direction or a zone axis

3.6

interplanar spacing

d_hkl

perpendicular distance between consecutive planes of the crystallographic plane set (h k l) (3.3)

3.7

(uvw)*

notation for a set of planes in the reciprocal lattice

Note 1 to entry: The normal of the reciprocal plane (uvw)* is parallel to the crystallographic zone axis [uvw] (3.5) .

3.8

reciprocal vector

g_hkl

vector in the reciprocal lattice

Note 1 to entry: The reciprocal vector, g_hkl, is normal to the crystallographic plane (h k l) (3.3) with its magnitude inversely proportional to interplanar spacing (3.6).

3.9

R vector

R_hkl

vector from centre, 000 (the origin), to the diffraction spot, hkl, in a diffraction pattern

Note 1 to entry: See Figure 1.

3.10

camera length

L

effective distance between the specimen and the plane where diffraction pattern is formed

[SOURCE:ISO 15932:2010, 3.7]

3.11

camera constant

Lλ

product of the wavelength of the incident electron wave and camera length (3.10)

Note 1 to entry: Because of the small Bragg angle, the Bragg condition can be given in the first-order approximation, (3.9) is the distance of the diffraction spot, hkl, from the incident beam.

[SOURCE:ISO 15932:2010, 3.8, modified]

3.12

bright field image

image formed using only the non-scattered beam, selected by observation of the back focal plane of the objective lens and using the objective aperture to cut out all diffracted beams

[SOURCE:ISO 15932:2010, 5.6]

3.13

dark field image

image formed by a diffracted beam only by using the objective aperture for selection or by collecting the diffracted beam with an annular dark-field detector

[SOURCE:ISO 15932:2010, 5.6]

3.14

energy-dispersive X-ray spectroscopy

EDS

analytical technique which enables the elemental analysis or chemical characterization of a specimen by analysing characteristic X-ray emitted by the matter in response to electron irradiation

[SOURCE:ISO 15932:2010, 6.6]

3.15

eucentric position

specimen position at which the image exhibits minimal lateral motion resulting from specimen tilting